Spectroscopy Study of Amorphous Tungsten Oxide Films used in Electrochromic Multilayered Structures
نویسندگان
چکیده
Amorphous Tungsten Oxide (alpha-WO3) film is one of the most studied electrochromic (EC) materials. It can be used as EC layer in EC devices. Electrochromism can be described as reversible change optical properties, by an applied external voltage. Here alpha-WO3 thin films were deposited onto glass and ITO substrates by reactive DC magnetron sputtering for EC application. Growth temperature, oxygen partial pressure, and total gas pressure have been varied to obtain the thin films. They were analyzed by spectroscopy in the range of near infrared (NIR), visible and ultraviolet (UV-vis) spectra. X-ray diffraction, X-ray photoelectron spectroscopy and atomic force microscopy were also used in order to characterize the film structure. We obtain information on the tungsten oxide optical properties, a percentage of void fraction, surface roughness and film thickness.
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